l******7 发帖数: 311 | 1 我现在用这个技术制作纳米级的光栅,但是issue是经常不uniform,不知道如何用力才
能uniform,我是新来的,经验不够,也找不到solutions所以想请教大家,谢谢! |
m******y 发帖数: 2207 | 2 I don't think there is a solution. it is an intrinsic problem. |
l******7 发帖数: 311 | 3
那怎样才能做的更好啊?
【在 m******y 的大作中提到】 : I don't think there is a solution. it is an intrinsic problem.
|
h***s 发帖数: 111 | 4 nanoimprint or photolithography? by the way, what's the scale you are
working on? <100 nm?
【在 l******7 的大作中提到】 : 我现在用这个技术制作纳米级的光栅,但是issue是经常不uniform,不知道如何用力才 : 能uniform,我是新来的,经验不够,也找不到solutions所以想请教大家,谢谢!
|
c*s 发帖数: 2145 | 5 你的图案应该是block-copolymer吧,用化学刻蚀除掉了一个嵌断?
【在 h***s 的大作中提到】 : nanoimprint or photolithography? by the way, what's the scale you are : working on? <100 nm?
|
l******7 发帖数: 311 | 6
nanoimprint lithography, around 100 nm
【在 h***s 的大作中提到】 : nanoimprint or photolithography? by the way, what's the scale you are : working on? <100 nm?
|
h***s 发帖数: 111 | 7 it was PS-PMMA without any etching
【在 c*s 的大作中提到】 : 你的图案应该是block-copolymer吧,用化学刻蚀除掉了一个嵌断?
|
h***s 发帖数: 111 | 8 I would not think there will be any problem, 100 nm should be pretty easy to
achieve. Do you have any hard template, e.g. Si or SiN, instead of PDMS?
BTW, what's the aspect ratio?
【在 l******7 的大作中提到】 : : nanoimprint lithography, around 100 nm
|
c*s 发帖数: 2145 | 9 恩,基本猜对,是sem?
【在 h***s 的大作中提到】 : it was PS-PMMA without any etching
|
l******7 发帖数: 311 | 10 没有etching啊,直接放到激光下curing,好了就成型了 |
l******7 发帖数: 311 | 11
to
0.5
【在 h***s 的大作中提到】 : I would not think there will be any problem, 100 nm should be pretty easy to : achieve. Do you have any hard template, e.g. Si or SiN, instead of PDMS? : BTW, what's the aspect ratio?
|